SPUTTERING TARGETS / EVAPORATION MATERIAL / NANOMETER MATERIALSCRAP WAFER

SPUTTERING TAGETS  

The targets include 4 types (on raw material): metal sputtering targets, alloy sputtering targets, ceramic sputtering targets targets, crystal sputtering targets. Maybe what you need is not in the lists. Rater Enterprise would be happy to review custom shapes, compositions and comment on the possibility of manufacturing. In our lab, our engineer will study it. In this field we also can supply back plate and bond's serving, also we can supply many kinds of mosaic targets. (PS: Rater Enterprise supplied substrate in good quality).

Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%.
Shape: foil, sheet, rod, pipe, tube, wafer, plate, tablet, crystal, other especially type or etc.

Dimension: Diameter (<500mm), Length (<1000mm), Width (<500mm), Thickness (>1mm), Custom-Made
 

EVAPORATION MATERIALS

Evaporation material are widely used for optical, electric, decorate and so on. If you would like to know lots,  The evaporation materials include (on raw materials): Metal Evaporation Material , Oxide Evaporation Material, Fluorid Evaporation Material, Other Compound Evaporation Material , Mixture Evaporation Material , alloy evaporation material.

Specifications of shaped materials:

Purity: 99%, 99.9%, 99.99%, 99.999% and 99.9999%.
Shape: foil, sheet, wire, filament, powder, pellet, shot, tablet, ingot, chunk, lump, granule, dendritic, crystal, etc.

 

NANOMETER MATERIALS

Nanometer Powder:

Aluminum Nitride (AlN), Cerium Oxide (CeO2), Europium Oxide (Eu2O3), Erbium Oxide ( Er2O3), Gadolinium Oxide ( Gd2O3), Lanthanum (LawO3), Neodymium Oxide (Nd2O3), Praseodymium Oxide (Pr6O11), Samarium Oxide (Sm2O3), Silicon Carbide (¦Â-Sic), Silicon Nitride whisker (Si3N4), Amorphous Silicon Nitride (¦Á-Si3N4), Titanium Carbide (TiC), Titanium Nitride (TiN), Ytterbium Oxide (Yb2O3), Yttrium Oxide (Y2O3)

Specifications

Purity: 99%, 99.9%, 99.99% and 99.999%.

Granularity: D50:10nm, 20nm,30nm,40nm,50nm,60nm,70nm,80nm